Fully Automatic Roll-to-Plate Imprinting Line for High-Throughput Nanoimprint Lithography with Customizable Pressure
Datos del producto:
| Lugar de origen: | Porcelana |
| Nombre de la marca: | OSMANUV |
| Certificación: | ISO9001 |
| Número de modelo: | Especificación |
Pago y Envío Términos:
| Cantidad de orden mínima: | 1 juego |
|---|---|
| Precio: | Negociable |
| Detalles de empaquetado: | Envasado de madera |
| Tiempo de entrega: | 30-45 días |
| Condiciones de pago: | T/T |
| Capacidad de la fuente: | Negociación |
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Información detallada |
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| Velocidad de recubrimiento: | Alta velocidad | Diámetro de goma: | 100mm |
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| embalaje: | Caja de madera estándar | Ancho de trabajo: | 600/1000/1300 |
| Rodillo de dosificación: | 164 mm*1450 mm | Fuerza: | 45kw |
| Qty del rodillo: | 2 piezas | Caja eléctrica: | caja eléctrica independiente |
| Resaltar: | fully automatic nanoimprint lithography machine,roll-to-plate UV coating machine,customizable pressure imprinting line |
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Descripción de producto
This imprinting production line is designed for high-throughput, high-resolution replication of micro/nanostructures using UV nanoimprint lithography (NIL) or thermal imprinting. It supports rigid substrates (silicon, glass, metal) and flexible films (PET, PI, PEN). The system integrates coating, alignment, imprinting, curing, and demolding. Imprinting pressure, temperature, UV dose, and number of stations are fully customizable for various resin systems and pattern sizes.
| Parameter | Standard Value / Range | Customization Option |
|---|---|---|
| Imprint technology | UV-NIL / Thermal NIL | Hybrid UV+thermal customizable |
| Max substrate size | 300 mm × 300 mm (square) / 8″ wafer | Customizable up to 500 ×500 mm |
| Imprint pressure | 0.5 - 10 bar | Customizable up to 50 bar |
| Temperature range (thermal) | RT - 200°C | Customizable up to 350 °C |
| UV intensity | 50 - 500 mW/cm² | Customizable wavelength & intensity |
| Alignment accuracy | ± 5 μm (std) / ± 0.5 μm (high-precision) | Customizable optical alignment |
| Production throughput | 60 - 120 substrates/hour | Depends on customizable cycle time |
| Imprint area uniformity | ≥ 95% | Customizable multi-zone pressure control |
| Power supply | AC 400V / 50Hz (3-phase) | Customizable to 480V / 60Hz |
- Diffractive optical elements (DOE) & metalenses
- Augmented reality (AR) / virtual reality (VR) waveguide manufacturing
- Anti-reflective (AR) & hydrophobic surfaces
- Biomedical microfluidic devices
- Flexible electronics & printed sensors
- Customizable for large-area display optical films
We provide full production line customization including:
- Number of imprint stations (single‑stage to multi‑step)
- Substrate transfer method (robot, conveyor, roll-to-roll)
- Resin dispensing type (spin, slot-die, spray - customizable)
- Imprint stamp (soft PDMS, hard quartz, Ni shim) - customizable stamp docking
- Cleanroom integration (ISO 5 to ISO 8 - customizable)
- Factory automation interface (SECS/GEM, OPC UA - customizable)
- High residual layer uniformity < ± 5%
- Low imprint force option for fragile stamps
- Real‑time force & temperature feedback control
- Automatic stamp cleaning cycle (customizable interval)
- Recipe‑based operation with barcode or RFID tracking
- Customizable safety enclosure & light curtains
- Global remote diagnostics (VPN / secure tunnel)
- On‑site commissioning & operator training (up to 5 days included)
- Process transfer support - resin & stamp supplier matching
- Customizable maintenance contract (quarterly / semi‑annual)
- 24‑month warranty on imprinting chamber & actuators
- Anti‑vibration crate with humidity control
- Vacuum‑sealed desiccant bags for critical optics
- Shipping: FOB or CIF - customizable pallet labeling & export packaging
- Lead time: standard 6 weeks, customized lines 10 -14 weeks






